Functional sputtering target material

JuShiTai's functional sputtering target material is a key material used in the manufacturing and surface coating of various electronic devices. Functional sputtering targets play a key role in semiconductor manufacturing, optical coatings, electronic device manufacturing, photovoltaic technology, and other fields. Their high purity and precise performance control are crucial for ensuring thin film quality and electronic device performance.

These target materials are usually high-purity materials that undergo precise preparation processes to ensure they have specific chemical compositions and performance characteristics. Preparation typically involves processes such as high-temperature melting, uniform mixing, cooling, forging, and cutting to obtain the desired shape and size. During the thin film preparation process, these materials are converted into thin films and deposited onto substrates through sputtering technology, thereby preparing thin film layers with specific properties and functions.

Functional sputtering target material

Product specifications

Main specifications

Functional sputtering targets: titanium silicon, titanium aluminum, aluminum chromium, chromium, titanium, etc     

Large size: The maximum specification can reach 400 * 378 * 30mm     High purity: 99.99%     High density: TD95% or more with uniform composition     Grain size:< 200μm     

Surface roughness: Ra0.4     Size requirement: Customized according to customer requirements

Process: Vacuum hot pressing Product application: Surface strengthening for tools, molds, etc

JuShiTai Functional Sputtering Target Material

VS Traditional Target Materials

JuShiTai's functional sputtering targets have multiple advantages over traditional targets, which are crucial in the fields of electronic device manufacturing and thin film coating:

JuShiTai's functional sputtering targets provide higher controllability, customization, and performance in the high-end technology field compared to traditional targets. This makes them indispensable in applications such as semiconductor manufacturing, photovoltaic technology, and display technology.

High purity and precise performance: JuShiTai's functional sputtering targets typically have extremely high purity and low impurity content. This ensures consistent quality during the thin film deposition process, reducing defects and impurities in the device. In contrast, traditional target materials may contain higher impurities and have lower controllability of their performance.

Customization and diversity: JuShiTai's target materials can usually be customized according to customer needs, including composition, size, and shape customization. This means that JuShiTai can provide customized solutions for specific applications. Traditional target materials generally do not have this high degree of customization.

Repeatability and consistency: The preparation process of JuShiTai is precisely controlled to ensure the consistency and quality of the target material. This helps to improve the repeatability of the manufacturing process and reduce variability in production. The preparation process of traditional target materials may be difficult to precisely control, resulting in unstable performance.

Application of jushitai functional sputtering target material

Semiconductor manufacturing: These target materials are used in the semiconductor industry for manufacturing processes such as physical vapor deposition (PVD) and chemical vapor deposition (CVD), and are used to prepare semiconductor devices such as integrated circuits, transistors, and thin film transistors.

Display technology: Functional sputtering targets are widely used in the manufacturing of flat panel displays, including liquid crystal displays (LCD) and organic light-emitting diode (OLED) technologies.

Photovoltaic cells: In solar cell manufacturing, these target materials are used to prepare thin films of photovoltaic materials, such as copper indium gallium selenide (CIGS) thin film solar cells.

Optical coatings: These target materials are used to prepare various optical coatings for the production of optical components, mirrors, lenses, filters, and other optical devices.

JuShiTai's functional sputtering targets are key materials in the electronics industry, supporting electronic device manufacturing and surface coating applications in multiple fields. Its high purity, customizability, and wide applicability have played a key role in the continuous development of electronic technology.

Magnetic storage: In the manufacturing of magnetic storage devices such as hard disk drives, these target materials are used to prepare magnetic thin films.

Functional sputtering 

target material

JuShiTai's functional sputtering target material is a key material used in the manufacturing and surface coating of various electronic devices. Functional sputtering targets play a key role in semiconductor manufacturing, optical coatings, electronic device manufacturing, photovoltaic technology, and other fields. Their high purity and precise performance control are crucial for ensuring thin film quality and electronic device performance.

These target materials are usually high-purity materials that undergo precise preparation processes to ensure they have specific chemical compositions and performance characteristics. Preparation typically involves processes such as high-temperature melting, uniform mixing, cooling, forging, and cutting to obtain the desired shape and size. During the thin film preparation process, these materials are converted into thin films and deposited onto substrates through sputtering technology, thereby preparing thin film layers with specific properties and functions.

Functional sputtering target material

Main specifications

Functional sputtering targets: titanium silicon, titanium aluminum, aluminum chromium, chromium, titanium, etc

Large size: The maximum specification can reach 400 * 378 * 30mm

High purity: 99.99%

High density: TD95% or more with uniform composition

Grain size:< 200μm     

Surface roughness: Ra0.4     

Size requirement: Customized according to customer requirements

Process: Vacuum hot pressing

Product application: Surface strengthening for tools, molds, etc

Product specifications

JuShiTai Functional Sputtering 

Target Material VS Traditional 

Target Materials

JuShiTai's functional sputtering targets have multiple advantages over traditional targets, which are crucial in the fields of electronic device manufacturing and thin film coating:

JuShiTai's functional sputtering targets provide higher controllability, customization, and performance in the high-end technology field compared to traditional targets. This makes them indispensable in applications such as semiconductor manufacturing, photovoltaic technology, and display technology.

Application of jushitai 

functional sputtering 

target material

JuShiTai's functional sputtering targets are key materials in the electronics industry, supporting electronic device manufacturing and surface coating applications in multiple fields. Its high purity, customizability, and wide applicability have played a key role in the continuous development of electronic technology.

Magnetic storage: In the manufacturing of magnetic storage devices such as hard disk drives, these target materials are used to prepare magnetic thin films.