Thin film photovoltaic sputtering target material

Shitai produces various types of thin-film photovoltaic sputtering targets, including different metal, oxide, and compound materials. These materials are the basis for preparing solar cell thin films and have specific optoelectronic properties. We can customize thin film photovoltaic sputtering targets according to customer requirements, including customization of material composition, size, and shape.

Thin film photovoltaic sputtering is a common process for preparing thin film solar cells. In this process, the thin film photovoltaic sputtering target is heated, causing its material to evaporate and deposit on the substrate, forming a thin film layer. This process requires high-quality target materials to ensure the quality and performance of the film.

Thin film photovoltaic sputtering target material

Thin film photovoltaic sputtering target material

·Tungsten titanium target material

Large size: The maximum size can reach 400 * 378 * 35 mm.

High purity: 99.99%.

High density: TD99% or above.

Uniform composition

Grain size:<200 μm

Surface roughness: Ra0.4

Size requirement: Customized according to customer requirements

Process: Vacuum hot pressing

Product Applications: Semiconductor Devices, Flat Panel Displays, Thin Film Photovoltaic Cells

·Copper indium gallium selenide target material

Large size: D260 * Hmm.

High purity: 99.99%

High density: TD98%

Uniform composition

Grain size:<200 μm

Surface roughness: Ra0.4

Size requirement: Customized according to customer requirements

Process: Vacuum hot pressing

Product application: Photovoltaic cells

Product specifications

JuShiTai thin film photovoltaic sputtering target material

VS Traditional Target Materials

JuShiTai's thin-film photovoltaic sputtering targets have some significant advantages compared to other targets, such as:

JuShiTai's thin-film photovoltaic sputtering targets have significant advantages over other targets in terms of high purity, customization, sustainability, and wide application. These advantages contribute to the advancement of solar cell manufacturing and promote the development of clean energy technologies.

High purity and consistency: JuShiTai thin film photovoltaic sputtering targets typically have extremely high purity and consistency, which helps reduce impurities and defects in thin film solar cells and improve cell efficiency. However, some traditional targets may not be as pure and consistent as JuShiTai's targets.

Customization capability: JuShiTai can customize the composition, size, and shape of materials according to specific customer requirements. This allows customers to obtain target materials that meet their specific needs, while some traditional target materials may not have the same level of customization capabilities.

Sustainability: JuShiTai focuses on sustainable development, and its target material preparation process usually considers environmental friendliness and resource efficiency to reduce the consumption of natural resources, while some traditional target material production processes may not be environmentally friendly enough.

Application of JuShiTai thin film photovoltaic 

sputtering target material

Thin film solar cell manufacturing: JuShiTai's thin film photovoltaic sputtering targets are widely used in the manufacturing of thin film solar cells. Thin film solar cells are a highly efficient type of solar cell, typically including different thin film technologies such as copper indium gallium selenide (CIGS), copper indium gallium sulfide (CIGS), and amorphous silicon. These target materials are used to deposit material films on the surface of batteries to capture solar energy and generate electrical energy.

Building Integrated Photovoltaics: These target materials are also used to manufacture Building Integrated Photovoltaics (BIPV) materials. BIPV materials can integrate solar cells into the exterior of buildings for power generation or to meet the energy needs of buildings. Thin film solar cells are particularly useful in BIPV applications because they are lightweight, flexible, and can adapt to various building designs.

Portable electronic devices: Some thin-film solar cells are also used to manufacture portable electronic devices, such as solar chargers and wearable devices. These small batteries typically require efficient thin film materials to ensure charging in limited sunlight.

JuShiTai's thin-film photovoltaic sputtering targets are widely used in various fields, from large solar cells to portable electronic devices, playing a crucial role in promoting the development and application of clean energy technology.

Thin film photovoltaic 

sputtering target material

Shitai produces various types of thin-film photovoltaic sputtering targets, including different metal, oxide, and compound materials. These materials are the basis for preparing solar cell thin films and have specific optoelectronic properties. We can customize thin film photovoltaic sputtering targets according to customer requirements, including customization of material composition, size, and shape.

Thin film photovoltaic sputtering is a common process for preparing thin film solar cells. In this process, the thin film photovoltaic sputtering target is heated, causing its material to evaporate and deposit on the substrate, forming a thin film layer. This process requires high-quality target materials to ensure the quality and performance of the film.

Thin film photovoltaic sputtering target material

Thin film photovoltaic sputtering target material

·Tungsten titanium target material

Large size: The maximum size can reach 400 * 378 * 35 mm.

High purity: 99.99%.

High density: TD99% or above.

Uniform composition

Grain size:<200 μ m

Surface roughness: Ra0.4

Size requirement: Customized according to customer requirements

Process: Vacuum hot pressing

Product Applications: Semiconductor Devices, Flat Panel Displays, Thin Film Photovoltaic Cells

·Copper indium gallium selenide target material

Large size: D260 * Hmm.

High purity: 99.99%

High density: TD98%

Uniform composition

Grain size:<200 μ m

Surface roughness: Ra0.4

Size requirement: Customized according to customer requirements

Process: Vacuum hot pressing

Product application: Photovoltaic cells

Product specifications

JuShiTai thin film photovoltaic sputtering target material

VS Traditional Target Materials

JuShiTai's thin-film photovoltaic sputtering targets have some significant advantages compared to other targets, such as:

JuShiTai's thin-film photovoltaic sputtering targets have significant advantages over other targets in terms of high purity, customization, sustainability, and wide application. These advantages contribute to the advancement of solar cell manufacturing and promote the development of clean energy technologies.

Application of JuShiTai thin film 

photovoltaic sputtering 

target material

JuShiTai's thin-film photovoltaic sputtering targets are widely used in various fields, from large solar cells to portable electronic devices, playing a crucial role in promoting the development and application of clean energy technology.